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Ultra-smooth single crystal diamond surfaces resulting from implantation and lift-off processes
Tran Thi T. N., Fernandez B., Eon D., Gheeraert E., Haertwig J. et al
Physica Status Solidi a Applications and Materials Science 208, 9 (2011) 2057-2061 - http://hal.archives-ouvertes.fr/hal-00740914
Sciences de l'ingénieur/Génie des procédés
Ultra-smooth single crystal diamond surfaces resulting from implantation and lift-off processes
Thu Nhi Tran Thi1, Bruno Fernandez1, David Eon ()1, Etienne Gheeraert ()1, Juergen Haertwig ()2, T. Lafford2, A. Perrat-Mabilon3, C. Peaucelle3, P. Olivero4, Etienne Bustarret (, http://lepes.polycnrs-gre.fr/)1
1 :  NEEL - Institut Néel
http://www.neel.cnrs.fr/
CNRS : UPR2940 – Université Joseph Fourier - Grenoble I – Institut National Polytechnique de Grenoble (INPG)
25 avenue des Martyrs - BP 166 38042 GRENOBLE CEDEX 9
France
2 :  ESRF - European Synchrotron Radiation Facility
http://www.esrf.fr/
ESRF
6 rue Jules Horowitz BP220 38043 GRENOBLE CEDEX
France
3 :  IPNL - Institut de Physique Nucléaire de Lyon
http://www.ipnl.in2p3.fr/
CNRS : UMR5822 – IN2P3 – Université Claude Bernard - Lyon I (UCBL)
France
4 :  Faculty of Mathematics, Physics and Natural Sciences
University of Torino
University of Torino, Torino
France
NanoFab
SC2G
A method for obtaining a smooth, single crystal diamond surface is presented, whereby a sacrificial defective layer is created by implantation of a regular (4 nm roughness) Ib diamond plate. This was then graphitized by annealing before being selectively etched. We have used O(+) at 240 keV, the main process variables being the ion fluence (ranging from 3 x 10(15) to 3 x 10(17)cm(-2)) and the final etching process (wet etch, H(2) plasma, and annealing in air). The substrates were characterized by atomic force microscopy, optical profilometry and white beam X-ray topography. The influence of the various process parameters on the resulting lift-off efficiency and final surface roughness is discussed. An O(+) fluence of 2 x 10(17)cm(-2) was found to result in sub-nanometer roughness over tens of mu m(2).
Anglais

Physica Status Solidi a Applications and Materials Science
Publisher Wiley-Blackwell
ISSN 0031-8965 (eISSN : 1521-396X)
internationale
Articles dans des revues avec comité de lecture
09/2011
208
9
2057-2061