| For the application of the $^1H(^{15}N, \alpha\gamma)^{12}C$ resonant nuclear reaction to hydrogen measurement in surface studies, an ultrahigh vacuum equipment (2 × 10${-8}$Pa) has been developed which includes two interconnected UHV chambers for analysis and target preparation, respectively. The analysis chamber equipped with a quadrupole mass spectrometer and a precision leak valve for gas admission, is connected to a 4 MV Van de Graaff accelerator through a two-stage differentially pumped beam line. The beam intensity is monitored with a transmission Faraday cup. Samples can be analysed at controlled temperature over the range 300–700 K. The preparation chamber is equipped with a sputter ion gun, an electron bombardment gun for high-temperature heating and an electron beam evaporation station for thin film deposition. The performance of the system will be discussed through the following applications. Hydrogen concentration in sputtered thin films (20–30 nm) of amorphous Cu-Zr alloys has been measured from room temperature to crystallization temperature. Preliminary results have been obtained in a study of hydrogen adsorption on polycrystalline nickel. |
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