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Radiation damage induced at the surface of titanium by argon ions of a few MeV
Do N.-L., Bérerd N., Moncoffre N., Yang F., Trocellier P. et al
Journal of Nuclear Materials 419 (2011) 168-176 - http://hal.in2p3.fr/in2p3-00667208
Radiation damage induced at the surface of titanium by argon ions of a few MeV
N.-L. Do1, N. Bérerd2, 3, N. Moncoffre2, F. Yang4, P. Trocellier5, Y. Serruys5, D. Gorse-Pomonti1
1 :  LSI - UMR 7642 - Laboratoire des Solides Irradiés
CNRS : UMR7642 – Polytechnique - X – CEA : DSM/IRAMIS
LSI - UMR 7642, 28 route de Saclay, F-91128 Palaiseau Cedex
2 :  IPNL - Institut de Physique Nucléaire de Lyon
CNRS : UMR5822 – IN2P3 – Université Claude Bernard - Lyon I
3 :  IUT A
Université Claude Bernard - Lyon I
4 :  LPICM - Laboratoire de physique des interfaces et des couches minces
CNRS : UMR7647 – Polytechnique - X
bat. 408 Route de Saclay 91128 PALAISEAU CEDEX
5 :  SRMP - Service de recherches de métallurgie physique
CEA Saclay 91191 Gif sur Yvette
Oxide films thermally grown on titanium in a weakly oxidizing environment (5 × 10−3 Pa of dry air) under irradiation with 2, 4 and 9 MeV argon have been studied. The AFM study reveals a cratering effect of 2, 4 and 9 MeV argon and a significant surface roughening effect of 2 MeV argon, both effects being largely unexpected in this energy range. The XPS analysis shows that the TiO2 stoichiometry of the superficial oxide film is fairly well maintained under argon irradiation. The Spectroscopic Ellipsometry analysis reveals an oxide film thickness multiplied by a factor of three under irradiation with 2 MeV argon by comparison with 9 MeV argon, the irradiation effect on oxide growth remaining very limited for 4 or 9 MeV argon. The possible role of the electronic but most certainly of the nuclear energy losses on the surface damage mechanism are discussed. It is suggested that the oxidizing environment is necessary to freeze the instantaneous surface damage and permits the post-mortem observation.

Articles dans des revues avec comité de lecture
Journal of Nuclear Materials (J. Nucl. Mater.)
Publisher Elsevier
ISSN 0022-3115 (eISSN : 0022-3115)