| Thème(s) : |
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Planète et Univers/Sciences de la Terre/Minéralogie
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| Titre : |
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Recrystallization of amorphous ion implanted silicon carbide after thermal annealing |
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| Auteur : |
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S. Miro1, J.-M. Costantini1, S. Sorieul2, L. Gosmain1, L. Thomé3 |
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| Laboratoire : |
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| équipe(s) de recherche : |
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INSTRU CSNSM PCI |
| Résumé : |
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Single crystals of 6H-SiC were implanted at room temperature with 4-MeV Au ions to a fluence of 1015cm 2. Raman spectra showed that full amorphization was achieved. The recrystallization process was studied by micro-Raman spectrometry after isochronal thermal annealing between 700 and 1500 C. The spectra permitted the evolution upon annealing of Si-C bonds, and also of Si-Si and C-C bonds, to be followed. Amorphous phase relaxation takes place below 700 C; then recrystallization of the 6H polytype sets in at 700 C. At 900 C crystallites with different crystalline states are formed. Moreover, Raman spectra provide evidence of graphitic nanocluster formation at 1500 C. |
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| Type de publication : |
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Articles dans des revues avec comité de lecture |
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Date de publication ou d'écriture : |
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2012 |
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| Nom du périodique : |
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| Philosophical Magazine Letters (Philos. Mag. Lett.) |
| Publisher |
Taylor & Francis: STM, Behavioural Science and Public Health Titles |
| ISSN |
0950-0839 (eISSN : 1362-3036) |
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| Volume : |
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92 |
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| Page/Article : |
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633-639 |
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| Identifiant local : |
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CSNSM PCI |
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| Mot(s)-clé(s) : |
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SiC – Raman spectroscopy – recrystallization – irradiation effects |
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