Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing

Janyce Franc; Vincent Barnier; Francis Vocanson; Émilie Gamet; Marilyne Lesage; Damien Jamon; Yves Jourlin

HAL : ujm-00681960, version 1

DOI : 10.1016/j.tsf.2012.03.093

Fiche détaillée

Récupérer au format

Thin Solid Films 520, 19 (2012) 6050

Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing

Janyce Franc^{1, 2}, Vincent Barnier^{3, 4}, Francis Vocanson², Émilie Gamet², Marilyne Lesage², Damien Jamon⁵, Yves Jourlin²

(30/03/2012)

The aim of this study is the elaboration of a high index sol-gel material in order to prepare submicrometric grating. The gratings were obtained after few seconds of UV exposure in one step using an organically modified silica-hafnia matrix. The chemical composition of thin films after UV and annealing treatments were studied using Fourier Transform Infrared Spectroscopy and X-Ray Photoelectron Spectroscopy. The study of optical properties revealed that the annealed films are transparent from 200 to 1000 nm and have a refractive index from 1.550 to 1.701 depending on the hafnium concentration.

1 :	LMA - Laboratoire des matériaux avancés

2 :	LAHC - LAboratoire Hubert Curien

3 :	MPI-ENSMSE - Département Mécanique physique et interfaces

4 :	LCG-ENSMSE - UMR 5146 - Laboratoire Claude Goux

5 :	LT2C - Laboratoire Telecom Claude Chappe

domaine

Chimie/Matériaux

Sciences de l'ingénieur/Matériaux

mots-clés : Photosensitivity – Thin Films – Sol-gel Deposition – Silica – Hafnia – X-ray photoelectron Spectroscopy – Diffraction gratings


ujm-00681960, version 1
http://hal-ujm.ccsd.cnrs.fr/ujm-00681960
oai:hal-ujm.ccsd.cnrs.fr:ujm-00681960
Contributeur : Francis Vocanson <>
Soumis le : Vendredi 23 Mars 2012, 07:56:07
Dernière modification le : Mercredi 4 Juillet 2012, 08:06:23