Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing

Janyce Franc; Vincent Barnier; Francis Vocanson; Émilie Gamet; Marilyne Lesage; Damien Jamon; Yves Jourlin

HAL: ujm-00681960, version 1

DOI: 10.1016/j.tsf.2012.03.093

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Thin Solid Films 520, 19 (2012) 6050

Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing

Janyce Franc^{1, 2}, Vincent Barnier^{3, 4}, Francis Vocanson², Émilie Gamet², Marilyne Lesage², Damien Jamon⁵, Yves Jourlin²

(2012-03-30)

The aim of this study is the elaboration of a high index sol-gel material in order to prepare submicrometric grating. The gratings were obtained after few seconds of UV exposure in one step using an organically modified silica-hafnia matrix. The chemical composition of thin films after UV and annealing treatments were studied using Fourier Transform Infrared Spectroscopy and X-Ray Photoelectron Spectroscopy. The study of optical properties revealed that the annealed films are transparent from 200 to 1000 nm and have a refractive index from 1.550 to 1.701 depending on the hafnium concentration.

1:	LMA - Laboratoire des matériaux avancés

2:	LAHC - LAboratoire Hubert Curien

3:	MPI-ENSMSE - Département Mécanique physique et interfaces

4:	LCG-ENSMSE - UMR 5146 - Laboratoire Claude Goux

5:	LT2C - Laboratoire Telecom Claude Chappe

subject

Chemical Sciences/Material chemistry

Engineering Sciences/Materials

keyword(s) : Photosensitivity – Thin Films – Sol-gel Deposition – Silica – Hafnia – X-ray photoelectron Spectroscopy – Diffraction gratings


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From: Francis Vocanson <>
Submitted on: Friday, 23 March 2012 07:56:07
Updated on: Wednesday, 4 July 2012 08:06:23