45 articles – 154 Notices  [english version]
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Optical System Design 2003, Saint-Etienne : France
Original optical metrologies of large components
B. Cimma1, D. Forest1, P. Ganau1, B. Lagrange1, J.M. Mackowski1, C. Michel1, J.L. Montorio1, N. Morgado1, R. Pignard1, L. Pinard1, A. Remillieux1
VIRGO Collaboration(s)

The coating deposition on large optical components (diameter 350 mm) has required the development of new metrology tools at 1064 nm. To give realistic values of the optical performances, the whole surface of the component needs to be scanned. Our scatterometer (commercial system) has been upgraded to support large and heavy samples. The other metrology tools are prototypes we have developed. We can mention the absorption (photothermal effect) and birefringence bench, a control interferometer equipped with an original stitching option, the optical profilometer (RMS roughness and small defect measurements). A detailed description of these metrology benches will be exposed. Their sensitivity, accuracy and capability to map the optical properties of substrates or mirrors will be discussed. We will describe the recent developments: the stitching option adapted to the Micromap profilometer to measure the RMS roughness on larger area (exploration of a new spatial frequency domain), the accurate bulk absorption calibration.
1 :  LMA - Laboratoire des matériaux avancés
Planète et Univers/Astrophysique

Physique/Astrophysique/Cosmologie et astrophysique extra-galactique
Optical metrology – scattering – absorption – birefringence – roughness – stitching interferometry
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