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Masking technique for coating thickness control on large and strongly curved aspherical optics
Sassolas B., Flaminio R., Franc J., Michel C., Montorio J.-L. et al
Applied Optics 46 (2009) 3760-3765 - http://hal.in2p3.fr/in2p3-00418223
Sciences de l'ingénieur/Optique / photonique
Physique/Matière Condensée/Science des matériaux
Masking technique for coating thickness control on large and strongly curved aspherical optics
B. Sassolas1, R. Flaminio1, J. Franc1, C. Michel1, J.-L. Montorio1, N. Morgado1, L. Pinard1
1 :  LMA - Laboratoire des matériaux avancés
CNRS : USR3264 – IN2P3 – Université Claude Bernard - Lyon I (UCBL)
Bâtiment 213 VIRGO 22 7 avenue Pierre de Coubertin 69622 VILLEURBANNE CEDEX
France
This paper discusses a method to control the coating thickness deposited onto large and strongly curved optics by ion beam sputtering. The technique uses an original design of the mask used to screen part of the sputtered materials. A first multi-element mask is calculated from the measured 2D coating thickness distribution. Then, by means of an iterative process the final mask is designed. By using such a technique, it has been possible to deposit layers of tantalum pentoxide having a high thickness gradient onto a curved substrate 500 mm in diameter. Residual errors in the coating thickness profile are below 0.7%.

Articles dans des revues avec comité de lecture
2009
Applied Optics (Appl Opt)
Publisher Optical Society of America
ISSN 0003-6935 (eISSN : 1539-4522)
46
3760-3765

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