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Thin Solid Films 520, 19 (2012) 6050
Submicrometric gratings fabrication from photosensitive organo-silica-hafnia thin films elaborated by sol-gel processing
Janyce Franc1, 2, Vincent Barnier3, 4, Francis Vocanson2, Émilie Gamet2, Marilyne Lesage2, Damien Jamon5, Yves Jourlin2

The aim of this study is the elaboration of a high index sol-gel material in order to prepare submicrometric grating. The gratings were obtained after few seconds of UV exposure in one step using an organically modified silica-hafnia matrix. The chemical composition of thin films after UV and annealing treatments were studied using Fourier Transform Infrared Spectroscopy and X-Ray Photoelectron Spectroscopy. The study of optical properties revealed that the annealed films are transparent from 200 to 1000 nm and have a refractive index from 1.550 to 1.701 depending on the hafnium concentration.
1 :  LMA - Laboratoire des matériaux avancés
2 :  LHC - LAboratoire Hubert Curien [Saint Etienne]
3 :  MPI-ENSMSE - Département Mécanique physique et interfaces
4 :  LCG-ENSMSE - UMR 5146 - Laboratoire Claude Goux
5 :  LT2C - Laboratoire Telecom Claude Chappe

Sciences de l'ingénieur/Matériaux
Photosensitivity – Thin Films – Sol-gel Deposition – Silica – Hafnia – X-ray photoelectron Spectroscopy – Diffraction gratings