Journal Articles
Surface and Coatings Technology
Year : 1996
Jocelyne Lorgeril : Connect in order to contact the contributor
https://hal.in2p3.fr/in2p3-00000511
Submitted on : Monday, February 22, 1999-11:04:00 AM
Last modification on : Wednesday, September 16, 2020-4:06:21 PM
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- HAL Id : in2p3-00000511 , version 1
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R. Etemadi, C. Godet, J. Perrin, J.E. Bouree, B. Drevillon, et al.. Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films. Surface and Coatings Technology, 1996, 80, pp.8-12. ⟨in2p3-00000511⟩
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