Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films - Archive ouverte HAL Access content directly
Journal Articles Surface and Coatings Technology Year : 1996

Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films

, , , , , (1)
1
R. Etemadi
  • Function : Author
C. Godet
J. Perrin
  • Function : Author
J.E. Bouree
B. Drevillon
  • Function : Author
Not file

Dates and versions

in2p3-00000511 , version 1 (22-02-1999)

Identifiers

  • HAL Id : in2p3-00000511 , version 1

Cite

R. Etemadi, C. Godet, J. Perrin, J.E. Bouree, B. Drevillon, et al.. Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films. Surface and Coatings Technology, 1996, 80, pp.8-12. ⟨in2p3-00000511⟩

Collections

IN2P3 CSNSM CNRS
3 View
0 Download

Share

Gmail Facebook Twitter LinkedIn More