Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films

R. Etemadi; C. Godet; J. Perrin; J.E. Bouree; B. Drevillon; C. Clerc

Journal Articles Surface and Coatings Technology Year : 1996

Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films

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1

R. Etemadi

Function : Author

C. Godet

Function : Author
PersonId : 496
IdHAL : christian-godet
IdRef : 032545134

CV

J. Perrin

Function : Author

J.E. Bouree

Function : Author
PersonId : 181974
IdHAL : jean-eric-bouree

CV

B. Drevillon

Function : Author

C. Clerc

Function : Author

Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse

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Physics [physics] Physics [physics] Instrumentation and Detectors [physics.ins-det]

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Submitted on : Monday, February 22, 1999-11:04:00 AM

Last modification on : Thursday, March 9, 2023-3:05:38 PM

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in2p3-00000511 , version 1 (22-02-1999)

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HAL Id : in2p3-00000511 , version 1

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R. Etemadi, C. Godet, J. Perrin, J.E. Bouree, B. Drevillon, et al.. Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films. Surface and Coatings Technology, 1996, 80, pp.8-12. ⟨in2p3-00000511⟩

Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films

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