Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devices - IN2P3 - Institut national de physique nucléaire et de physique des particules Access content directly
Conference Papers Year : 2000

Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devices

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in2p3-00004033 , version 1 (02-03-2000)

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  • HAL Id : in2p3-00004033 , version 1

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C. Bieth, J.L. Bouly, J.C. Curdy, S. Kantas, P. Sortais, et al.. Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devices. International Conference on Ion sources 8, 1999, Kyoto, Japan. pp.899-901. ⟨in2p3-00004033⟩
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