High resolution magnetic patterning using focused ion beam irradiation

Christophe Vieu; J. Gierk; H. Launois; T. Aign; P. Meyer; J.P. Jamet; J. Ferre; C. Chappert; V. Mather; H. Bernas

Journal Articles Microelectronic Engineering Year : 2000

High resolution magnetic patterning using focused ion beam irradiation

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Christophe Vieu

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IdHAL : christophe-vieu
ORCID : 0000-0003-2745-8743
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J. Gierk

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H. Launois

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T. Aign

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P. Meyer

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J.P. Jamet

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J. Ferre

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C. Chappert

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V. Mather

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H. Bernas

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Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse

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https://hal.in2p3.fr/in2p3-00006349

Submitted on : Thursday, September 28, 2000-5:08:22 PM

Last modification on : Friday, June 2, 2023-3:36:26 PM

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in2p3-00006349 , version 1 (28-09-2000)

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HAL Id : in2p3-00006349 , version 1

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Christophe Vieu, J. Gierk, H. Launois, T. Aign, P. Meyer, et al.. High resolution magnetic patterning using focused ion beam irradiation. Microelectronic Engineering, 2000, 53, pp.191-194. ⟨in2p3-00006349⟩

High resolution magnetic patterning using focused ion beam irradiation

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