Iron silicide formed in a-Si:Fe thin films by magnetron co-sputtering and ion implantation - IN2P3 - Institut national de physique nucléaire et de physique des particules Access content directly
Journal Articles Vacuum Year : 2002

Iron silicide formed in a-Si:Fe thin films by magnetron co-sputtering and ion implantation

M. Nikolaeva
  • Function : Author
M. Sendova-Vassileva
  • Function : Author
D. Dimova-Malinovska
  • Function : Author
D. Karpuzov
  • Function : Author
G. Beshkov
  • Function : Author
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Dates and versions

in2p3-00012843 , version 1 (05-06-2003)

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  • HAL Id : in2p3-00012843 , version 1

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M. Nikolaeva, M. Sendova-Vassileva, D. Dimova-Malinovska, D. Karpuzov, J.C. Pivin, et al.. Iron silicide formed in a-Si:Fe thin films by magnetron co-sputtering and ion implantation. Vacuum, 2002, 69, pp.221-225. ⟨in2p3-00012843⟩
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