The electrochemical behaviour in acidic and chloride solutions of amorphous hydrogenated carbon thin films deposited on single crystal germanium slices (n-type) by plasma decomposition of methane - IN2P3 - Institut national de physique nucléaire et de physique des particules Access content directly
Journal Articles Corrosion Science Year : 1993

The electrochemical behaviour in acidic and chloride solutions of amorphous hydrogenated carbon thin films deposited on single crystal germanium slices (n-type) by plasma decomposition of methane

Abstract

The electrochemical behaviour of a-C:H thin films (1.25 μm) deposited on germanium substrates is studied in aerated solutions by means of rest potential, voltammetric and impedance measurements. All tests indicate that there is no contact between the germanium and the electrolyte after immersion of the electrodes and show the notable stability in aerated salt solutions of a-C:H layers deposited on germanium. According to these results a new equivalent circuit is proposed to simulate the electrochemical behaviour of the electrode/electrolyte interface.

Dates and versions

in2p3-00013063 , version 1 (03-03-1999)

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D. Vouagner, A.M. de Becdelievre, Michel Keddam, J.-M. Mackowski. The electrochemical behaviour in acidic and chloride solutions of amorphous hydrogenated carbon thin films deposited on single crystal germanium slices (n-type) by plasma decomposition of methane. Corrosion Science, 1993, 34 (2), pp.279-293. ⟨10.1016/0010-938X(93)90007-4⟩. ⟨in2p3-00013063⟩
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