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Journal Articles Applied Surface Science Year : 1990

Growth kinetics of titanium silicide during heating by RTA and furnace annealing

A. Saulnier
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in2p3-00016164 , version 1 (29-06-2000)

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  • HAL Id : in2p3-00016164 , version 1

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J.P. Ponpon, A. Saulnier. Growth kinetics of titanium silicide during heating by RTA and furnace annealing. Applied Surface Science, 1990, 40, pp.315. ⟨in2p3-00016164⟩
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