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Variation of yield with thickness in sims and pdms: measurements of secondary ion emission from organized molecular films

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http://hal.in2p3.fr/in2p3-00016565
Contributor : Suzanne Robert Connect in order to contact the contributor
Submitted on : Friday, August 25, 2000 - 3:05:56 PM
Last modification on : Wednesday, September 16, 2020 - 4:04:08 PM

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  • HAL Id : in2p3-00016565, version 1

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G. Bolbach, R. Beavis, S. Della Negra, C. Deprun, W. Ens, et al.. Variation of yield with thickness in sims and pdms: measurements of secondary ion emission from organized molecular films. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Elsevier, 1988, 30, pp.74-82. ⟨in2p3-00016565⟩

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