Excimer laser induced oxidation of ion-implanted Si

E. Fogarassy; C.W. White; A. Slaoui; C. Fuchs; P. Siffert; S.J. Pennycook

Journal Articles Applied Physics Letters Year : 1988

Excimer laser induced oxidation of ion-implanted Si

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1

E. Fogarassy

Function : Author

Institut de Recherches Subatomiques

C.W. White

Function : Author

A. Slaoui

Function : Author

Institut de Recherches Subatomiques

C. Fuchs

Function : Author

Institut de Recherches Subatomiques

P. Siffert

Function : Author

Institut de Recherches Subatomiques

S.J. Pennycook

Function : Author

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in2p3-00017473 , version 1 (26-09-2000)

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HAL Id : in2p3-00017473 , version 1

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E. Fogarassy, C.W. White, A. Slaoui, C. Fuchs, P. Siffert, et al.. Excimer laser induced oxidation of ion-implanted Si. Applied Physics Letters, 1988, 53, pp.1720. ⟨in2p3-00017473⟩

Excimer laser induced oxidation of ion-implanted Si

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