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Analysis of UV-laser induced oxidation of implanted silicon by optical reflectivity measurements

F. Foulon 1 A. Slaoui 1 E. Fogarassy 1 C. Fuchs 1 P. Siffert 1 
1 IReS - Institut de Recherches Subatomiques
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http://hal.in2p3.fr/in2p3-00017479
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Tuesday, September 26, 2000 - 4:34:59 PM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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F. Foulon, A. Slaoui, E. Fogarassy, C. Fuchs, P. Siffert. Analysis of UV-laser induced oxidation of implanted silicon by optical reflectivity measurements. Applied physics. A, Materials science & processing, Springer Verlag, 1988, 47, pp.255. ⟨in2p3-00017479⟩

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