Journal Articles
Applied physics. A, Materials science & processing
Year : 1988
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https://hal.in2p3.fr/in2p3-00017479
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- HAL Id : in2p3-00017479 , version 1
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F. Foulon, A. Slaoui, E. Fogarassy, C. Fuchs, P. Siffert. Analysis of UV-laser induced oxidation of implanted silicon by optical reflectivity measurements. Applied physics. A, Materials science & processing, 1988, 47, pp.255. ⟨in2p3-00017479⟩
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