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Journal Articles Applied physics. A, Materials science & processing Year : 1988

Analysis of UV-laser induced oxidation of implanted silicon by optical reflectivity measurements

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Cosmology and Extra-Galactic Astrophysics [astro-ph.CO]

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https://hal.in2p3.fr/in2p3-00017479

Submitted on : Tuesday, September 26, 2000-4:34:59 PM

Last modification on : Tuesday, November 7, 2023-11:28:04 AM

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in2p3-00017479 , version 1 (26-09-2000)

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  • HAL Id : in2p3-00017479 , version 1

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F. Foulon, A. Slaoui, E. Fogarassy, C. Fuchs, P. Siffert. Analysis of UV-laser induced oxidation of implanted silicon by optical reflectivity measurements. Applied physics. A, Materials science & processing, 1988, 47, pp.255. ⟨in2p3-00017479⟩

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