Argon ion induced X-ray analysis of silicon and chlorine in cadmium telluride

J. Cailleret; C. Heitz; G. Lagarde; C. Scharager; P. Siffert; D. Tenorio

Journal Articles Journal of Radioanalytical Chemistry Year : 1980

Argon ion induced X-ray analysis of silicon and chlorine in cadmium telluride

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1

J. Cailleret

Function : Author

Institut de Recherches Subatomiques

C. Heitz

Function : Author

Institut de Recherches Subatomiques

G. Lagarde

Function : Author

C. Scharager

Function : Author

P. Siffert

Function : Author

Institut de Recherches Subatomiques

D. Tenorio

Function : Author

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https://hal.in2p3.fr/in2p3-00017898

Submitted on : Thursday, October 26, 2000-3:11:21 PM

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in2p3-00017898 , version 1 (26-10-2000)

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J. Cailleret, C. Heitz, G. Lagarde, C. Scharager, P. Siffert, et al.. Argon ion induced X-ray analysis of silicon and chlorine in cadmium telluride. Journal of Radioanalytical Chemistry, 1980, 55, pp.339-344. ⟨in2p3-00017898⟩

Argon ion induced X-ray analysis of silicon and chlorine in cadmium telluride

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