Laser-beam annealing of heavily damaged implanted layers on silicon - IN2P3 - Institut national de physique nucléaire et de physique des particules Access content directly
Journal Articles Applied Physics Letters Year : 1978

Laser-beam annealing of heavily damaged implanted layers on silicon

No file

Dates and versions

in2p3-00018025 , version 1 (08-11-2000)

Identifiers

  • HAL Id : in2p3-00018025 , version 1

Cite

J.C. Muller, A. Grob, J.J. Grob, R. Stuck, P. Siffert. Laser-beam annealing of heavily damaged implanted layers on silicon. Applied Physics Letters, 1978, 33, pp.287-289. ⟨in2p3-00018025⟩
4 View
0 Download

Share

Gmail Facebook Twitter LinkedIn More