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Journal Articles Applied physics. A, Materials science & processing Year : 1984

Formation of Palladium silicide by rapid thermal annealing

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in2p3-00018090 , version 1 (16-11-2000)

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  • HAL Id : in2p3-00018090 , version 1

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D. Levy, A. Grob, J.J. Grob, J.P. Ponpon. Formation of Palladium silicide by rapid thermal annealing. Applied physics. A, Materials science & processing, 1984, 35, pp.141. ⟨in2p3-00018090⟩
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