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Journal Articles Radiation Effects Year : 1971

Low energy boron implantation profiles in silicon from junction depth measurements

P. Sebillotte
  • Function : Author
M. Badanoiu
  • Function : Author
P. Siffert
  • Function : Author
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in2p3-00018479 , version 1 (22-12-2000)

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  • HAL Id : in2p3-00018479 , version 1

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P. Sebillotte, M. Badanoiu, V.B. Ndocko-Ndongue, P. Siffert. Low energy boron implantation profiles in silicon from junction depth measurements. Radiation Effects, 1971, 7, pp.7-15. ⟨in2p3-00018479⟩
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