Analysis of the thermal contribution to UV laser-induced oxidation of silicon and silicon monoxide

E. Fogarassy; S. de Unamuno; J.L. Regolini; C. Fuchs

Journal Articles Philosophical Magazine B Year : 1987

Analysis of the thermal contribution to UV laser-induced oxidation of silicon and silicon monoxide

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1

E. Fogarassy

Function : Author

Institut de Recherches Subatomiques

S. de Unamuno

Function : Author

Institut de Recherches Subatomiques

J.L. Regolini

Function : Author

C. Fuchs

Function : Author

Institut de Recherches Subatomiques

Yvette Heyd : Connect in order to contact the contributor

https://hal.in2p3.fr/in2p3-00018826

Submitted on : Tuesday, January 23, 2001-8:04:57 AM

Last modification on : Friday, June 2, 2023-3:36:26 PM

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in2p3-00018826 , version 1 (23-01-2001)

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HAL Id : in2p3-00018826 , version 1

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E. Fogarassy, S. de Unamuno, J.L. Regolini, C. Fuchs. Analysis of the thermal contribution to UV laser-induced oxidation of silicon and silicon monoxide. Philosophical Magazine B, 1987, 55, pp.253-260. ⟨in2p3-00018826⟩

Analysis of the thermal contribution to UV laser-induced oxidation of silicon and silicon monoxide

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