Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm

E. Boch; C. Fuchs; E. Fogarassy; P. Siffert

Journal Articles Applied Surface Science Year : 1989

Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm

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1

E. Boch

Function : Author

C. Fuchs

Function : Author

Institut de Recherches Subatomiques

E. Fogarassy

Function : Author

Institut de Recherches Subatomiques

P. Siffert

Function : Author

Institut de Recherches Subatomiques

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Instrumentation and Detectors [physics.ins-det]

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https://hal.in2p3.fr/in2p3-00018827

Submitted on : Tuesday, January 23, 2001-8:18:02 AM

Last modification on : Friday, June 2, 2023-3:36:26 PM

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in2p3-00018827 , version 1 (23-01-2001)

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HAL Id : in2p3-00018827 , version 1

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E. Boch, C. Fuchs, E. Fogarassy, P. Siffert. Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm. Applied Surface Science, 1989, 43, pp.17-22. ⟨in2p3-00018827⟩

Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm

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