Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm - IN2P3 - Institut national de physique nucléaire et de physique des particules Access content directly
Journal Articles Applied Surface Science Year : 1989

Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm

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in2p3-00018827 , version 1 (23-01-2001)

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  • HAL Id : in2p3-00018827 , version 1

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E. Boch, C. Fuchs, E. Fogarassy, P. Siffert. Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm. Applied Surface Science, 1989, 43, pp.17-22. ⟨in2p3-00018827⟩
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