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Journal Articles Applied Physics Year : 1979

Calculated temperature distribution during laser annealing in silicon and cadmium telluride

R.O. Bell
  • Function : Author
M. Toulemonde
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Dates and versions

in2p3-00019490 , version 1 (31-05-2001)

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  • HAL Id : in2p3-00019490 , version 1

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R.O. Bell, M. Toulemonde, P. Siffert. Calculated temperature distribution during laser annealing in silicon and cadmium telluride. Applied Physics, 1979, 19, pp.313-319. ⟨in2p3-00019490⟩
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