Shrinkage mechanism of nanocavities in amorphous Si under ion irradiation: An in situ study - Archive ouverte HAL Access content directly
Journal Articles Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Year : 2003
Not file

Dates and versions

in2p3-00022247 , version 1 (09-09-2004)

Identifiers

  • HAL Id : in2p3-00022247 , version 1

Cite

M.O. Ruault, M.C. Ridgway, F. Fortuna, H. Bernas, J.S. Williams. Shrinkage mechanism of nanocavities in amorphous Si under ion irradiation: An in situ study. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2003, 206, pp.912-915. ⟨in2p3-00022247⟩
6 View
0 Download

Share

Gmail Facebook Twitter LinkedIn More