Xenon versus helium behavior in UO2 single crystals: A TEM investigation - IN2P3 - Institut national de physique nucléaire et de physique des particules Access content directly
Journal Articles Journal of Nuclear Materials Year : 2006

Xenon versus helium behavior in UO2 single crystals: A TEM investigation

Abstract

The behavior of He and Xe implanted into UO2 single crystals is studied by in situ TEM experiments before and after annealing up to 700 °C. TEM micrographs show that annealing induces the formation of noble-gas bubbles in both cases. However, the size (25 nm for He and 3–5 nm for Xe) and the nucleation temperature (600 °C for He and 400 °C for Xe) of bubbles depend on implanted species. These results are explained by the radiation damage produced by ion implantation (different by a factor of 100 for the two elements) and the diffusion mechanisms involved in each case.

Dates and versions

in2p3-00091674 , version 1 (06-09-2006)

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G. Sattonnay, L. Vincent, F. Garrido, L. Thomé. Xenon versus helium behavior in UO2 single crystals: A TEM investigation. Journal of Nuclear Materials, 2006, 355, pp.131-135. ⟨10.1016/j.jnucmat.2006.04.013⟩. ⟨in2p3-00091674⟩
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