Effect of annealing on the superconducting properties of a-NbxSi1-x thin films - IN2P3 - Institut national de physique nucléaire et de physique des particules Access content directly
Journal Articles Physical Review B: Condensed Matter and Materials Physics (1998-2015) Year : 2013

Effect of annealing on the superconducting properties of a-NbxSi1-x thin films

Abstract

a-NbxSi1-x thin films with thicknesses down to 25 Å have been structurally characterized by transmission electron microscopy measurements. As-deposited or annealed films are shown to be continuous and homogeneous in composition and thickness, up to an annealing temperature of 500 ∘C. We have carried out low-temperature transport measurements on these films close to the superconductor-to-insulator transition (SIT) and shown a qualitative difference between the effect of annealing or composition and a reduction of the film thickness on the superconducting properties of a-NbSi. These results question the pertinence of the sheet resistance R□ as the relevant parameter to describe the SIT.

Dates and versions

in2p3-00851988 , version 1 (19-08-2013)

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Cite

O. Crauste, A. Gentils, F. Couëdo, Y. Dolgorouky, L. Bergé, et al.. Effect of annealing on the superconducting properties of a-NbxSi1-x thin films. Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2013, 87, pp.144514. ⟨10.1103/PHYSREVB.87.144514⟩. ⟨in2p3-00851988⟩
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