Skip to Main content Skip to Navigation
New interface
Journal articles

IR emission from the target during plasma magnetron sputter deposition

Abstract : In this article, energy flux measurements at the substrate location are reported. In particular, the energy flux related to IR radiation emanating from the titanium (10 cm in diam.) target surface is quantified during magnetron sputter deposition processes. In order to modulate the plasma-target surface interaction and the radiative energy flux thereof, the working conditions were varied systematically. The experiments were performed in balanced and unbalanced magnetic field configurations with direct current (DC), pulsed DC and high power impulse magnetron sputtering (HiPIMS) discharges. The power delivered to the plasma was varied too, typically from 100 to 800 W. Our data show that the IR contribution to the total energy flux at the substrate increases with the supplied sputter power and as the discharge is driven in a pulse regime. In the case of HiPIMS discharge generated with a balanced magnetic field, the energy flux associated to the IR radiation produced by the target becomes comparable to the energy flux originating from collisional processes (interaction of plasma particles such as ions, electron, sputtered atoms etc. with the substrate). From IR contribution, it was possible to estimate the rise of the target surface temperature during the sputtering process. Typical values found for a titanium target are in the range 210 °C to 870 °C.
Document type :
Journal articles
Complete list of metadata

Cited literature [12 references]  Display  Hide  Download
Contributor : Dominique Girod Connect in order to contact the contributor
Submitted on : Friday, November 15, 2013 - 2:06:21 PM
Last modification on : Tuesday, October 12, 2021 - 5:20:24 PM
Long-term archiving on: : Sunday, February 16, 2014 - 4:28:27 AM


Files produced by the author(s)




P.-A. Cormier, A.-L. Thomann, Vincent Dolique, A. Balhamri, R. Dussart, et al.. IR emission from the target during plasma magnetron sputter deposition. Thin Solid Films, 2013, 545, pp.44-49. ⟨10.1016/j.tsf.2013.07.025⟩. ⟨in2p3-00874718⟩



Record views


Files downloads