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https://hal.in2p3.fr/in2p3-00943157
Submitted on : Friday, February 7, 2014-9:58:05 AM
Last modification on : Wednesday, July 19, 2023-10:47:01 AM
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- HAL Id : in2p3-00943157 , version 1
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A. Bès, Long Tan Phan, Stéphane Béchu, J. Pelletier, A. Lacoste. Microwave plasma with localized power absorption: from elementary sources to device andapplications. 8th International Conference on Reactive Plasmas - 31st Symposium on Plasma Processing (ICRP-8/SPP-31), Feb 2014, Fukuoka, Japan. ⟨in2p3-00943157⟩
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