Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration - IN2P3 - Institut national de physique nucléaire et de physique des particules Access content directly
Journal Articles Plasma Processes and Polymers Year : 2014

Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration

C. Vandenabeele
  • Function : Author
S. Bulou
  • Function : Author
F. Siffer
  • Function : Author
M. Gérard
  • Function : Author
T. Belmonte
P. Choquet
  • Function : Author

Dates and versions

in2p3-01094299 , version 1 (12-12-2014)

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C. Vandenabeele, R. Maurau, S. Bulou, F. Siffer, M. Gérard, et al.. Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration. Plasma Processes and Polymers, 2014, 11 (11), pp.1089-1101. ⟨10.1002/ppap.201400098⟩. ⟨in2p3-01094299⟩
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