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Communication Dans Un Congrès Année : 2009

Microstructural study of Fe-implanted SiC: Comparison of different post-implantation treatments

L. Thome
  • Fonction : Auteur
A. Debelle

Résumé

Silicon carbide (SiC) could be I good candidate for Diluted Magnetic Semiconductor (DMS). In this paper we report on preliminary results on the microstructure of Fe-implanted 6H-SiC subsequently submitted to Rapid Thermal Annealing (RTA), laser processing in the solid phase and swift heavy ion irradiation and analyzed by means of X-ray diffraction (XRD) and Rutherford backscattering and channeling (RBS/C).
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Dates et versions

in2p3-00684924 , version 1 (03-04-2012)

Identifiants

Citer

A. Declemy, C. Dupeyrat, L. Thome, A. Debelle. Microstructural study of Fe-implanted SiC: Comparison of different post-implantation treatments. 7th European Conference on Silicon Carbide and Related Materials, Sep 2008, Barcelone, Spain. pp.461-464, ⟨10.4028/www.scientific.net/MSF.615-617.461⟩. ⟨in2p3-00684924⟩
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