Isotopic fractionation of silicon negative ions sputtered from minerals by Cs+ bombardment - IN2P3 - Institut national de physique nucléaire et de physique des particules Accéder directement au contenu
Article Dans Une Revue Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Année : 2012

Isotopic fractionation of silicon negative ions sputtered from minerals by Cs+ bombardment

G. Slodzian
  • Fonction : Auteur
C. Engrand
J. Duprat

Résumé

Negative silicon ions sputtered from a set of olivines under Cs bombardment show useful yield UY variations depending on sample compositions. Those matrix effects are correlated with atomic concentrations of implanted cesium close to surface, which in turn depend on sputtering yields. It is shown that instrumental mass fractionations IMF on isotopes are depending on UY. A linear relationship between IMF and the inverse of Af, the Cs atomic fraction, is experimentally established for Si as well as a linear dependence of UY on Af. A model linking the two sets of experimental data is proposed. Measurement artefacts are reviewed. (C) 2011 Elsevier B.V. All rights reserved.

Dates et versions

in2p3-00693226 , version 1 (02-05-2012)

Identifiants

Citer

G. Slodzian, C. Engrand, J. Duprat. Isotopic fractionation of silicon negative ions sputtered from minerals by Cs+ bombardment. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2012, 275, pp.41-57. ⟨10.1016/j.nimb.2011.12.019⟩. ⟨in2p3-00693226⟩
19 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More